GTU BE 8th Semester 2183901 Nanolithography Summer 2018 Question Paper

Seat No.: ________ Enrolment No.___________
GUJARAT TECHNOLOGICAL UNIVERSITY
BE ? SEMESTER – VIII (NEW SYLLABUS) EXAMINATION- SUMMER 2018
Subject Code: 2183901 Date: 04-05-2018
Subject Name: Nanolithography
Time: 10:30 AM to 01:00 PM Total Marks: 70
Instructions:
1. Attempt all questions.
2. Make suitable assumptions wherever necessary.
3. Figures to the right indicate full marks.

MARKS
Q.1 (a) Define Positive resist. 03
(b) Explain the chemistry of Acid- Catalysed DUV resist. 04
(c) Write a note on steps involved in adhesion promotion. with a diagram (With (with a diagram
07

Q.2 (a) Define Negative resist. 03
(b) Explain the factors which affect the development of XRL. 04
(c) Explain how X-ray lithography works as a shadow printing technique. 07
OR
(c) Explain the phenomena of Poisson?s spot in lithography. 07
Q.3 (a) What does the measurement of residual thickness measurement indicate? 03
(b) Give the historical background for nanoimprint. 04
(c) Explain peeling demolding principle with a diagram. 07
OR
Q.3 (a) Differentiate between the filling regime and planar regime. 03
(b) Give an account on use of nanoimprint in the 19
th
century. 04
(c) Explain in detail how fabrication of mould is done. 07
Q.4 (a) Define CD Measurement. 03
(b) Explain the concept of local measurement and average local measurement
in terms of CD
04
(c) Write a general note on Grating optical diffractometry. 07
OR
Q.4 (a) What are the factors which affect the accuracy measurement in lithography. 03
(b) Explain how measurement reproducibility is important in terms of the CD. 04
(c) Give the principle of Scatterometry and explain the lightning scheme used
in it.
07
Q.5 (a) Mention the field where CD-SEM and X-SEM where use. 03
(b) Compare X-SEM v/s AFM 3D. 04
(c) Depending on needs explain the various type of lithography techniques in
detail.
07
OR
Q.5 (a) Write various techniques used in 1D, 2D and 3D. 03
(b) Give the difference between HRXRL and DXRL 04
(c) Evaluation of morphological damage generated by the primary electron
beam from CD-SEM.
07
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